Different photoinhibition of PSII and PSI in Eriobotrya japonica leaves in winter revealed by simultaneous measurements of chlorophyll fluorescence and 820 nm light reflection

doi:10.17521/cjpe.2024.0309

Abstract

Abstract:

Aims Loquat (Eriobotrya japonica) is evergreen tree that often suffers photoinhibition or photodamage at low temperature in winter, which affects its growth. Therefore, this study explored the photoinhibition of two photosystems of loquat leaves in winter.
Methods In this study, the photoinhibition of two photosystems of loquat leaves in winter was compared using simultaneous measurements of chlorophyll fluorescence and 820 nm light reflection.
Important findings From autumn to winter, the maximum quantum yield of photosystem II (PSII) (F_v/F_m) in loquat leaves decreased significantly, while the photosynthetic electron transfer capacity at both the donor and acceptor sides of PSII did not change. The activity of photosystem I (PSI) did not change either. However, the actual photochemical efficiencies of both PSII and PSI decreased significantly. Non-photochemical quenching decreased significantly under high light. From winter to spring, the value of F_v/F_m in loquat leaves increased significantly. The electron transfer capacity at the acceptor side of PSII and the activity of PSI also decreased. Moreover, the actual photochemical efficiency of PSII increased significantly, while that of PSI remained unchanged. Non-photochemical quenching increased significantly under high light. These results indicate that the photoinhibition of PSI occurred later than PSII in loquat leaves in winter. The activity of PSI also recovered slowly. Photoinhibition of PSII occurred earlier, and its activity recovered earlier.

Key words: Eriobotrya japonica, chlorophyll fluorescence, 820 nm light reflection, photoinhibition

ZHANG Wen-Ting, ZHANG Guo-Yun, PEI Guo-Liang, LI Peng-Min. Different photoinhibition of PSII and PSI in Eriobotrya japonica leaves in winter revealed by simultaneous measurements of chlorophyll fluorescence and 820 nm light reflection[J]. Chin J Plant Ecol, 2025, 49(7): 1156-1162.

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URL: https://www.plant-ecology.com/EN/10.17521/cjpe.2024.0309

https://www.plant-ecology.com/EN/Y2025/V49/I7/1156

Figures/Tables 3

Fig. 1 Induction kinetics of chlorophyll a fluorescence (A) and 820 nm reflection (B) in Eriobotrya japonica leaves growing in different seasons. Each curve was the average of five replicates. MR0, initial point of 820 nm reflection; MRmin, minimum of 820 nm reflection; MRmax, maximum of 820 nm reflection.

Fig. 2 Parameters derived from chlorophyll a fluorescence (A) and 820 nm reflection (B) kinetics in Eriobotrya japonica leaves growing in different seasons (mean ± SE, n = 5). Different lowercase letters above the bars indicate significant difference for same parameter among different seasons (p < 0.05, LSD). Fv/Fm, maximum quantum yield of PSII; Wk, relative variable fluorescence at K-step; Vi, relative variable fluorescence at I-step; Vj, relative variable fluorescence at J-step; VPSI, maximum decrease slope of 820 nm reflection; VPSII-PSI, maximum increase slope of 820 nm reflection.

Fig. 3 Actual photochemical efficiencies of two photosystems and non-photochemical quenching in Eriobotrya japonica leaves under light conditions in different seasons (mean ± SE, n = 5). ΦPSII, actual photochemical efficiency of PSII; ΦPSI, actual photochemical efficiency of PSI; NPQ, non-photochemical quenching; PPFD, photosynthetic photon flux density.

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